Diamond Micron Size
Particle size, PSD and morphology influence material removal and finishing behavior.
Explore SinoDiam's SND210 oil-soluble and SND220 water-soluble synthetic diamond polishing compounds for selected industrial finishing, mold and die polishing, metallographic preparation and precision lapping applications.
Compare carrier compatibility, diamond micron size, abrasive concentration and polishing requirements to identify a suitable compound for your process.
SinoDiam SND210 & SND220 Industrial Diamond Polishing Compounds
Diamond compound performance depends on both the abrasive particles and the carrier. The right selection starts with the workpiece and polishing method.
Diamond polishing compound combines industrial diamond abrasive particles with a carrier system that allows the abrasive to be distributed across a polishing surface.
SinoDiam's SND210 and SND220 products use different carrier approaches. SND210 is oil-based, while SND220 is water-compatible. The selection should consider the substrate, polishing medium, abrasive size, diamond loading and cleaning process.
Particle size, PSD and morphology influence material removal and finishing behavior.
The carrier affects handling, distribution, lubrication and cleanup requirements.
Abrasive loading and dispersion should match the intended polishing stage and equipment.
Oil-soluble and water-soluble refer to the compound carrier systems. Diamond particles do not dissolve in oil or water. A suitable cleaning process must consider both carrier residues and remaining abrasive particles.
Two carrier systems for different industrial polishing workflows. Compare the product specifications and application direction before selection.
SND210 and SND220 are both diamond compound products, but their carrier compatibility and application requirements are different.
Synthetic diamond polishing paste with an oil-based carrier for selected carbide die finishing, mold polishing and precision toolroom applications.
Important selection factors include micron size, diamond concentration, carrier compatibility, polishing medium and post-process cleaning.
Synthetic diamond polishing paste with a water-compatible carrier for selected metallographic preparation, laboratory lapping and technical ceramic finishing.
Important selection factors include specimen material, particle-size distribution, polishing cloth, water sensitivity and cleanup.
Current micron-size availability, diamond loading, packaging and other formulation details should be confirmed for each product. Application descriptions are technical selection directions.
Compare the carrier, polishing workflow, workpiece compatibility and cleaning requirements before selecting a diamond compound.
| Selection Factor | SND210 Oil-Soluble | SND220 Water-Soluble |
|---|---|---|
| Carrier | Oil-based / oil-compatible | Water-soluble / water-compatible |
| Main Evaluation Direction | Carbide die polishing, mold finishing and precision toolroom applications | Metallographic specimen preparation, laboratory lapping and selected precision polishing |
| Polishing Medium | Evaluate with oil-compatible polishing cloths, laps and extenders | Evaluate with water-compatible polishing cloths, laps and extenders |
| Cleaning | Requires a suitable oil-compound cleaning procedure | Water-based cleanup may be appropriate; abrasive particles still require removal |
| Workpiece Compatibility | Confirm carrier residues, surface requirements and downstream processing | Confirm water sensitivity, corrosion risk and formulation compatibility |
| Diamond Micron Size | Confirm by current specification | Confirm by current specification |
| Diamond Concentration | Confirm loading and reporting basis | Confirm loading and reporting basis |
| Surface Quality | Depends on abrasive and process validation | Depends on abrasive and process validation |
| Product Details | View SND210 → | View SND220 → |
This table compares carrier-system selection factors. It does not imply that either product is universally more effective, more lubricating or easier to clean.
Particle size should be matched to the workpiece, processing stage, required surface finish and inspection method.
A nominal micron size is only one part of the abrasive specification. Particle-size distribution, crystal morphology and oversized grains can also influence polishing behavior.
Consider for suitable late-stage finishing operations where fine abrasive contact and oversize control are important.
Evaluate for selected processes requiring a balance between material removal and surface quality.
Consider for suitable earlier stages where more pronounced abrasive contact is acceptable and later finishing may follow.
D10, D50 and D90 describe points within a measured particle-size distribution. A nominal size label does not automatically equal D50, and sensitive polishing may require additional oversize particle control.
The ranges above are general application examples, not a verified inventory list for SND210 or SND220.
Diamond content, dispersion and carrier behavior are important when comparing polishing compounds.
May be evaluated for selected finishing operations requiring lower abrasive loading. Verify the actual concentration.
An intermediate loading option to evaluate where abrasive distribution and material removal need to be balanced.
Higher loading may be considered for suitable removal-oriented processes. It does not guarantee faster or better polishing.
Concentration may be reported as diamond mass fraction, abrasive mass per package, carat content or supplier-defined grades. Always confirm the basis.
Carrier viscosity, particle morphology and abrasive loading affect the distribution and handling of diamond particles during polishing.
Confirm current tube, syringe or jar availability, net compound weight and suitable dispensing requirements.
Compare formulations through representative polishing tests. Review removal behavior, surface quality and post-process cleanliness.
Request the product model, diamond particle size, PSD, concentration reporting basis, carrier specifications, package size and appropriate handling guidance.
Select a polishing compound according to the material, abrasive requirement, processing equipment and cleanup method.
Selected cemented carbide dies may be polished using suitable diamond compound formulations. Evaluate size and finish targets.
Explore SND210 →Oil-compatible polishing operations for suitable mold inserts and precision tooling surfaces.
Explore SND210 →Selected metallographic cross-sections and laboratory specimens where water-compatible diamond compound is appropriate.
Explore SND220 →Evaluate diamond abrasive compounds for suitable engineering ceramics, considering brittle damage and surface requirements.
Explore SND220 →Selected tooling components requiring localized material removal or controlled surface refinement.
Explore SND210 →Suitable electronic component specimens and hard-material cross-sections for laboratory analysis, subject to contamination and damage control.
Explore SND220 →These applications are technical evaluation directions. Direct semiconductor wafer processing, guaranteed mirror finishes or cleanroom qualification are not established by the compound name alone.
Define the complete polishing process before selecting SND210 or SND220.
Specify the material, hardness, initial surface and sensitivity to scratching, corrosion or water exposure.
Select oil-compatible or water-compatible handling according to the polishing medium and cleaning process.
Confirm the particle-size fraction, PSD requirements, diamond loading and preparation stage.
Evaluate surface roughness, scratches, removal behavior, remaining particles and processing consistency.
Diamond is suitable for many hard and abrasive materials, including selected cemented carbides and ceramics. For certain hardened ferrous materials, CBN-based abrasive products may be more appropriate. CBN paste availability should be confirmed separately rather than assumed for SND210 or SND220.
SinoDiam supports technical discussions covering synthetic diamond abrasives, polishing compound selection and international supply requirements.
Two compound families allow customers to evaluate different handling and polishing requirements.
Compare diamond grade, micron size, concentration, carrier compatibility and application needs.
Discuss industrial diamond materials through SinoDiam's international operations. Availability and origin are confirmed by order.
Common questions about oil-soluble and water-soluble diamond compounds, particle size and polishing selection.
Diamond polishing compound is a paste containing diamond abrasive particles dispersed in a suitable carrier. It is used in selected lapping and polishing operations.
SND210 is SinoDiam's oil-soluble diamond compound, while SND220 is its water-soluble diamond compound. Their main distinction is the carrier system and its compatibility with the polishing workflow and cleaning process.
No. Water solubility describes the carrier characteristics. Diamond abrasive particles remain solid and require suitable cleaning or removal.
Oil-based compound is an important option for selected mold and die polishing workflows. Whether it is preferable depends on the workpiece, lubricant compatibility, polishing method and cleanup.
Metallographic specimen preparation is an important application evaluation direction for SND220. Diamond size, polishing cloth, specimen material and cleanliness must be considered together.
Start with the workpiece, initial surface and process stage. Coarser particles may be evaluated for earlier removal stages, while finer particles may be appropriate for selected finishing operations. Confirm the required PSD.
No. Final finish depends on diamond size and morphology, oversized particles, polishing medium, pressure, contamination and workpiece characteristics.
Select concentration according to the abrasive size, polishing process, carrier and material removal requirements. Confirm the actual diamond loading for the chosen formulation.
No. They are general concentration categories. Numerical diamond content and reporting methods may differ by formulation and manufacturer.
Do not assume the oil-based and water-compatible carrier systems are compatible. Mixing may affect dispersion, viscosity and polishing results. Obtain formulation-specific guidance before mixing.
Abrasive selection for hardened ferrous materials requires care. CBN-based abrasives may be preferable for some processes. Workpiece suitability must be evaluated separately.
No universal cleanroom, semiconductor wafer or residue-free qualification is established by the water-soluble designation. Such uses require separate contamination and process qualification.
Historical SinoDiam catalogues reference different syringe, tube and jar configurations. Current package sizes, net compound weight and availability require confirmation.
Please provide the workpiece, polishing method, required micron size, diamond concentration, preferred carrier, cleaning needs, estimated quantity, packaging preference and delivery destination.
Whether your process involves carbide die polishing, precision mold finishing, metallographic preparation, laboratory lapping or suitable hard-material polishing, selecting the right diamond compound starts with the workpiece and application.
Share your required micron size, diamond concentration, preferred oil- or water-compatible carrier, polishing method, surface-quality target, expected quantity and delivery destination.
SinoDiam can discuss relevant SND210 and SND220 product specifications and the information needed to evaluate your polishing process.
Request Technical Information & Quotation →